IMPURITY EFFECTS IN MAGNETRON SPUTTER DEPOSITED TUNGSTEN FILMS

被引：12

作者：

WICKERSHAM, CE

POOLE, JE

PALMER, KE

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 06期

关键词：

D O I：

10.1116/1.583455

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：1339 / 1343

页数：5

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