SIOXNY CAPPED ANNEALING FOR SI-IMPLANTED GAAS

被引:30
作者
KUZUHARA, M [1 ]
KOHZU, H [1 ]
机构
[1] NEC CORP,DIV LSI 2,NAKAHARA KU,KAWASAKI 211,JAPAN
关键词
D O I
10.1063/1.94821
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:527 / 529
页数:3
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